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[IEEE 2010 27th International Conference on Microelectronics Proceedings - Nis, Serbia (2010.05.16-2010.05.19)] 2010 27th International Conference on Microelectronics Proceedings - Effect of RF discharge structure on silicon etching in CF4/O2
Grigoryev, Yu. N., Gorobchuk, A. G.Year:
2010
Language:
english
DOI:
10.1109/miel.2010.5490516
File:
PDF, 203 KB
english, 2010