[IEEE 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Berlin, Germany (2009.05.10-2009.05.12)] 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Superior etch performance of Ar/N2/F2 for PECVD chamber clean
Riva, Marcello, Pittroff, Michael, Schwarze, Thomas, Wieland, Robert, Oshinowo, JohnYear:
2009
Language:
english
DOI:
10.1109/asmc.2009.5155971
File:
PDF, 574 KB
english, 2009