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Chemical equilibration of plasma-deposited amorphous...

Chemical equilibration of plasma-deposited amorphous silicon with thermally generated atomic hydrogen

An, Ilsin, Li, Y. M., Wronski, C. R., Collins, R. W.
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Volume:
48
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.48.4464
Date:
August, 1993
File:
PDF, 390 KB
english, 1993
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