Nanolithography by elastomeric scattering mask: An...

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Nanolithography by elastomeric scattering mask: An application of photolithographic standing waves

G. Kostovski, A. Mitchell, A. Holland, E. Fardin, M. Austin
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Year:
2006
Language:
english
DOI:
10.1063/1.2190899
File:
PDF, 464 KB
english, 2006
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