Tunneling of holes observed at work function measurements of metal/HfO[sub 2]/SiO[sub 2]/n-Si gate stacks
Rothschild, J. A., Avraham, H., Lipp, E., Eizenberg, M.Volume:
96
Year:
2010
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3360879
File:
PDF, 436 KB
english, 2010