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Effect of postplasma treatment on characteristics of electron cyclotron resonance chemical vapor deposition SiOF films
Lee, Seoghyeong, Park, Jong-WanVolume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581606
File:
PDF, 557 KB
english, 1999