Reactive etching of positive and negative silicon cluster...

The Journal of Chemical Physics 1987 Vol. 86; Iss. 7

Reactive etching of positive and negative silicon cluster ions by nitrogen dioxide

Mandich, Mary L., Bondybey, Vladimir E., Reents, William D.
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Volume:
86
Year:
1987
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.451885
File:
PDF, 1.27 MB
english, 1987
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