Dynamic behavior of hydrogen in silicon nitride and oxynitride films made by low-pressure chemical vapor deposition
Arnoldbik, W. M., Marée, C. H. M., Maas, A. J. H., van den Boogaard, M. J., Habraken, F. H. P. M., Kuiper, A. E. T.Volume:
48
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.48.5444
Date:
August, 1993
File:
PDF, 613 KB
english, 1993