Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
Erdmann, Andreas, Shao, Feng, Agudelo, Viviana, Fühner, Tim, Evanschitzky, PeterVolume:
58
Language:
english
Journal:
Journal of Modern Optics
DOI:
10.1080/09500340.2010.515752
Date:
March, 2011
File:
PDF, 3.03 MB
english, 2011