Nonlinear photoresists for maskless photolithography on the basis of Ag-doped As[sub 2]S[sub 3] glassy films
Lyubin, V., Arsh, A., Klebanov, M., Dror, R., Sfez, B.Volume:
92
Year:
2008
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.2831006
File:
PDF, 434 KB
english, 2008