Boron-interstitial silicon clusters and their effects on transient enhanced diffusion of boron in silicon
Solmi, S., Bersani, M., Sbetti, M., Hansen, J. Lundsgaard, Larsen, A. NylandstedVolume:
88
Year:
2000
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1311826
File:
PDF, 350 KB
english, 2000