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A statistical approach to optimization of alumina etching in a high density plasma
Li, Xiao, Highsmith, Alton, Gupta, Subhadra, Paranjpe, Ajit, Rook, KatrinaVolume:
104
Year:
2008
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2967715
File:
PDF, 726 KB
english, 2008