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Anisotropic Ta2O5 waveguide etching using inductively coupled plasma etching
Muttalib, Muhammad Firdaus A., Chen, Ruiqi Y., Pearce, Stuart J., Charlton, Martin D. B.Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4884557
Date:
July, 2014
File:
PDF, 1.39 MB
english, 2014