The reduction of dislocations in oxygen implanted silicon-on-insulator layers by sequential implantation and annealing
Hill, Dale, Fraundorf, Phil, Fraundorf, GailVolume:
63
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.340436
File:
PDF, 843 KB
english, 1988