Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1993 / 9 Vol. 11; Iss. 5
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Reactive ion etching of via holes for GaAs high electron mobility transistors and monolithic microwave integrated circuits using Cl2/BCl3/Ar gas mixtures
Nordheden, K. J.Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.586515
Date:
September, 1993
File:
PDF, 690 KB
english, 1993