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Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications
Giroult-Matlakowski, G.Volume:
12
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.579100
Date:
September, 1994
File:
PDF, 956 KB
english, 1994