Impact of SOI Thickness on FUSI-Gate CESL CMOS Performance and Reliability
Chen, Yu-Ting, Chen, Kun-Ming, Yeh, Wen-Kuan, Yuan, Jiann-Shiun, Yeh, Fon-ShanVolume:
11
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2010.2072508
Date:
March, 2011
File:
PDF, 759 KB
english, 2011