Preparation of Metallic W Film by H 2...

Japanese Journal of Applied Physics 1991 / 10 Vol. 30; Iss. Part 1, No

Preparation of Metallic W Film by H 2 -Reduction of WO 3 Electron-Resist Film

Baba, Mamoru, Ohta, Kiyoshi, Ikeda, Toshio
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Volume:
30
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.2581
Date:
October, 1991
File:
PDF, 968 KB
1991
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