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Study of the low-lying electronic states of Si2 and Si−2 using negative ion photodetachment techniques
Kitsopoulos, T. N., Chick, C. J., Zhao, Y., Neumark, D. M.Volume:
95
Year:
1991
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.461057
File:
PDF, 893 KB
english, 1991