[IEEE 2008 IEEE 35th International Conference on Plasma Science (ICOPS) - Karlsruhe, Germany (2008.06.15-2008.06.19)] 2008 IEEE 35th International Conference on Plasma Science - Plasma density measurements in agressive etching gas environment
Ganachev, Ivan P., Nakamura, Keiji, Sugai, HideoYear:
2008
Language:
english
DOI:
10.1109/plasma.2008.4591018
File:
PDF, 35 KB
english, 2008