Boride-enhanced diffusion in silicon: Bulk and surface layers
Cowern, N. E. B., Theunissen, M. J. J., Roozeboom, F., van Berkum, J. G. M.Volume:
75
Year:
1999
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.124312
File:
PDF, 257 KB
english, 1999