Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1991 / 11 Vol. 9; Iss. 6
![](/img/cover-not-exists.png)
The relationship between critical dimension shift and diffusion in negative chemically amplified resist systems
Fedynyshyn, Theodore H.Volume:
9
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.585345
Date:
November, 1991
File:
PDF, 1.00 MB
english, 1991