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Characterization of low dielectric constant plasma polymer films deposited by plasma-enhanced chemical vapor deposition using decamethyl-cyclopentasiloxane and cyclohexane as the precursors
Yang, Jaeyoung, Lee, Sungwoo, Park, Hyoungsun, Jung, Donggeun, Chae, HeeyeopVolume:
24
Year:
2006
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2148414
File:
PDF, 498 KB
english, 2006