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X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy investigation of Al-related dipole at the HfO[sub 2]/Si interface
Zhu, L. Q., Barrett, N., Jégou, P., Martin, F., Leroux, C., Martinez, E., Grampeix, H., Renault, O., Chabli, A.Volume:
105
Year:
2009
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3066906
File:
PDF, 862 KB
english, 2009