Comparison of HfO[sub 2] films grown by atomic layer deposition using HfCl[sub 4] and H[sub 2]O or O[sub 3] as the oxidant
Park, Hong Bae, Cho, Moonju, Park, Jaehoo, Lee, Suk Woo, Hwang, Cheol Seong, Kim, Jong-Pyo, Lee, Jong-Ho, Lee, Nae-In, Kang, Ho-Kyu, Lee, Jong-Cheol, Oh, Se-JungVolume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1599980
File:
PDF, 592 KB
english, 2003