Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 3
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Effects of segregation strength and an external field on the thermal line edge and line width roughness spectra of a diblock copolymer resist
Bosse, August W.Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3581107
File:
PDF, 695 KB
english, 2011