Power coupling and utilization efficiencies of...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2014 / 07 Vol. 32; Iss. 4

Power coupling and utilization efficiencies of silicon-depositing plasmas in mixtures of H2, SiH4, Si2H6, and Si3H8

Sobolewski, Mark A., Ridgeway, Robert G., Bitner, Mark D., Sinatore, Dino, Hurley, Patrick T.
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Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4885368
Date:
July, 2014
File:
PDF, 1012 KB
english, 2014
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