Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1993 / 3 Vol. 11; Iss. 2
Reactive ion etching-induced damage studies and application to self-aligned InP/InGaAs heterojunction bipolar transistor technology
Chau, Hin-FaiVolume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.586702
Date:
March, 1993
File:
PDF, 1.21 MB
english, 1993