Residual stresses in DLC/Si and Au/Si systems: Application...

Journal of Materials Research 2002 / 4 Vol. 17; Iss. 4

Residual stresses in DLC/Si and Au/Si systems: Application of a stress-relaxation model to the nanoindentation technique

Lee, Yun-Hee, Kwon, Dongil
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Volume:
17
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/JMR.2002.0131
Date:
April, 2002
File:
PDF, 572 KB
english, 2002
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