Plasma oxidation mechanisms in tungsten silicide thin films

Journal of Applied Physics 1995 Vol. 78; Iss. 1

Plasma oxidation mechanisms in tungsten silicide thin films

Pérez-Casero, R., Perrière, J., Enard, J. P., Martínez-Duart, J. M.
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Volume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360635
File:
PDF, 819 KB
english, 1995
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