Thermal chemistry of the Cu-KI5 atomic layer deposition precursor on a copper surface
Ma, Qiang, Zaera, FranciscoVolume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4896940
Date:
January, 2015
File:
PDF, 6.20 MB
english, 2015