[IEEE 2008 16th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Las Vegas, NV, USA (2008.09.30-2008.10.3)] 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - Origin of local temperature variation during spike anneal and millisecond anneal
Beneyton, R., Colin, A., Bono, H., Cacho, F., Bidaud, M., Dumont, B., Morin, P., Barla, K.Year:
2008
Language:
english
DOI:
10.1109/rtp.2008.4690554
File:
PDF, 4.85 MB
english, 2008