Defect-free etching process for GaAs/AlGaAs...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2010 Vol. 28; Iss. 6

Defect-free etching process for GaAs/AlGaAs hetero-nanostructure using chlorine/argon mixed neutral beam

Wang, Xuan-Yu, Huang, Chi-Hsien, Ohno, Yuzo, Igarashi, Mokoto, Murayama, Akihiro, Samukawa, Seiji
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3499716
File:
PDF, 751 KB
english, 2010
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