Reducing the pattern redundancy in optical proximity...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2010 Vol. 28; Iss. 6

Reducing the pattern redundancy in optical proximity correction modeling by analyzing the pattern linearity

Li, Jianliang, Zhang, Lin, Yan, Qiliang, Melvin, Lawrence S., Lin, Chadwick, Su, Eason, Tang, Nail
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3511510
File:
PDF, 1.21 MB
english, 2010
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