Effective Work Function Engineering for Aggressively Scaled...

Japanese Journal of Applied Physics 2013 / 04 Vol. 52; Iss. 4S

Effective Work Function Engineering for Aggressively Scaled Planar and Multi-Gate Fin Field-Effect Transistor-Based Devices with High- k Last Replacement Metal Gate Technology

Veloso, Anabela, Chew, Soon Aik, Higuchi, Yuichi, Ragnarsson, Lars-Åke, Simoen, Eddy, Schram, Tom, Witters, Thomas, Ammel, Annemie Van, Dekkers, Harold, Tielens, Hilde, Devriendt, Katia, Heylen, Nancy
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.04CA02
Date:
April, 2013
File:
PDF, 1.87 MB
english, 2013
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