Direct measurements of sheath-accelerated secondary...

Plasma Sources Science and Technology 2002 / 05 Vol. 11; Iss. 2

Direct measurements of sheath-accelerated secondary electrons for monitoring the incident ion flux in plasma immersion ion implantation

Nakamura, Keiji, Tanaka, Mitsuaki, Sugai, Hideo
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Volume:
11
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/11/2/306
Date:
May, 2002
File:
PDF, 124 KB
english, 2002
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