Enhancement of thermal stability of NiSi films on (100)Si and (111)Si by Pt addition
Mangelinck, D., Dai, J. Y., Pan, J. S., Lahiri, S. K.Volume:
75
Year:
1999
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.124803
File:
PDF, 406 KB
english, 1999