Nature of interfaces and oxidation processes in...

Journal of Applied Physics 1989 Vol. 65; Iss. 10

Nature of interfaces and oxidation processes in Ge+-implanted Si

Srivatsa, A. R., Sharan, S., Holland, O. W., Narayan, J.
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Volume:
65
Year:
1989
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.343325
File:
PDF, 728 KB
english, 1989
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