Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity
Sansonnens, L., Schmidt, H., Howling, A. A., Hollenstein, Ch., Ellert, Ch., Buechel, A.Volume:
24
Year:
2006
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2189266
File:
PDF, 662 KB
english, 2006