Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1991 / 11 Vol. 9; Iss. 6
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Dry etched molybdenum silicide photomasks for submicron integrated circuit fabrication
Pierrat, C.Volume:
9
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.585326
Date:
November, 1991
File:
PDF, 921 KB
english, 1991