Metal Chloride Reduction Chemical Vapor Deposition for Ta,...

Japanese Journal of Applied Physics 2004 / 01 Vol. 43; Iss. 1A/B

Metal Chloride Reduction Chemical Vapor Deposition for Ta, Mo and Ir Films

Ogura, Yuzuru, Kobayashi, Chikako, Ooba, Yoshiyuki, Sakamoto, Hitoshi, Yahata, Naoki, Nishimori, Toshihiko
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.L56
Date:
January, 2004
File:
PDF, 175 KB
english, 2004
Conversion to is in progress
Conversion to is failed