Characterization of Ru thin-film conductivity upon atomic layer deposition on H-passivated Si(111)
Roodenko, K., Park, S. K., Kwon, J., Wielunski, L., Chabal, Y. J.Volume:
112
Year:
2012
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4766747
File:
PDF, 1.13 MB
english, 2012