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Characterization of scanning tunneling microscopy and atomic force microscopy-based techniques for nanolithography on hydrogen-passivated silicon
Fontaine, P. A., Dubois, E., Stiévenard, D.Volume:
84
Year:
1998
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.368334
File:
PDF, 733 KB
english, 1998