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Comparison of Cl[sub 2] and F[sub 2] based chemistries for the inductively coupled plasma etching of NiMnSb thin films
Hong, J., Caballero, J. A., Lambers, E. S., Childress, J. R., Pearton, S. J.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581815
File:
PDF, 478 KB
english, 1999