Comparison of Cl[sub 2] and F[sub 2] based chemistries for...

Comparison of Cl[sub 2] and F[sub 2] based chemistries for the inductively coupled plasma etching of NiMnSb thin films

Hong, J., Caballero, J. A., Lambers, E. S., Childress, J. R., Pearton, S. J.

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Volume:

Year:

1999

Language:

english

Journal:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

DOI:

10.1116/1.581815

File:

PDF, 478 KB

english, 1999

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