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Influence of Schottky and Poole–Frenkel emission on the retention property of YMnO[sub 3]-based metal/ferroelectric/insulator/semiconductor capacitors
Ito, Daisuke, Fujimura, Norifumi, Yoshimura, Takeshi, Ito, TaichiroVolume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1601292
File:
PDF, 358 KB
english, 2003