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[IEEE 2011 IEEE Workshop on Microelectronics and Electron Devices (WMED) - Boise, ID, USA (2011.04.22-2011.04.22)] 2011 IEEE Workshop on Microelectronics and Electron Devices - Optimized Germanium co-implant with B2H6 PLAD for better advanced PMOS device performance
Liu, Jennifer Lequn, Qin, Shu, Hu, Jeff, Mcteer, AllenYear:
2011
Language:
english
DOI:
10.1109/wmed.2011.5767280
File:
PDF, 40 KB
english, 2011