Fabrication of narrow-band-gap hydrogenated amorphous silicon by chemical annealing
Futako, Wataru, Takeoka, Shinya, Fortmann, Charles M., Shimizu, IsamuVolume:
84
Year:
1998
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.368202
File:
PDF, 384 KB
english, 1998