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Etching characteristics of organic low-k films interpreted by internal parameters employing a combinatorial plasma process in an inductively coupled H[sub 2]/N[sub 2] plasma
Moon, Chang Sung, Takeda, Keigo, Sekine, Makoto, Setsuhara, Yuichi, Shiratani, Masaharu, Hori, MasaruVolume:
107
Year:
2010
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3415535
File:
PDF, 622 KB
english, 2010