[IEEE 2012 24th International Conference on Microelectronics (ICM) - Algiers, Algeria (2012.12.16-2012.12.20)] 2012 24th International Conference on Microelectronics (ICM) - Oxide trap annealing by H2 cracking at E' center under NBTI stress
Tahanout, Cherifa, Nadji, Becharia, Tahi, Hakim, Djezzar, Boualem, Benabdelmoumene, Abdelmadjid, Chenouf, AmelYear:
2012
Language:
english
DOI:
10.1109/icm.2012.6471425
File:
PDF, 281 KB
english, 2012