Novel metal gates for high κ applications
Chang, Mei, Chen, Michael S., David, Anaïs, Gandikota, Srinivas, Ganguli, Seshadri, Hayden, Brian E., Hung, Steven, Lu, Xinliang, Mormiche, Claire, Noori, Atif, Smith, Duncan C. A., Vian, Chris J. B.Volume:
113
Year:
2013
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4780447
File:
PDF, 2.10 MB
english, 2013